A technical paper titled “Resistless EUV lithography: photon-induced oxide patterning on silicon” was published by researchers at Paul Scherrer Institute, University College London, ETH Zürich, and ...
A new organic material holds its shape under light and solvents, allowing engineers to build flexible, reliable electronics and light-sensitive devices without complex processing steps. (Nanowerk ...
Scanning probe microscopy (SPM) is a set of advanced methods for surface analysis. The recent advances in SPM of metals, polymers, insulating, and semiconductive materials are primarily due to the ...
Figure 1. A systematic diagram from material dimensions and patterning processes to device applications. Perovskite structure. Major patterning methods, including template-confined growth, inkjet ...
As anticipated, this year’s Advanced Lithography + Patterning Symposium was a very informative event, with many interesting papers being presented across a wide range of subjects. Many papers ...
SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...
A Dutch-German research team has built an interdigitated back contact PV device with a new patterning approach based on the enhanced oxidation rates under the local laser-doped n++ BSF regions. The ...
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