Tech Xplore on MSN

New semiconductor etching process achieves five-fold speed improvement

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
AZOM

Plasma Etching of SiO2 with High Selectivity Against Si3N4 and Si

Quadrupole mass-spectroscopy has reported significant neutral and ionic species in the unique C 5 HF 7 /O 2 /Ar plasma, including C x F y (X>2), C x HF y, and C x F y (Y/X<2). Using C 5 HF 7 /O 2 /Ar ...
Nature

Mechanism of selective SiO2/photoresist reactive ion etching in an inductively coupled plasma operated in a C4F8/H2 gas mixture

The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...
AZoNano

Highly Selective Etching of Silica Over Silicon Nitride and Silicon

Significant ionic and neutral species, including C x F y (X>2), C x HF y, and C x F y (Y/X<2), have been reported by quadrupole mass-spectroscopy in the unique C 5 HF 7 /O 2 /Ar plasma. When compared ...